IWJT2010 May 10 - 11, 2010 Shanghai, China

10^th International Workshop on Junction Technology
FuXuan Hotel at Fudan University

Papers collected in IWJT 2004 - 2009 have been indexed by EI database (Compendex)!

The 10^th International Workshop on Junction Technology (IWJT2010) will be held on May 10 - 11, 2010 in Shanghai, China. The IWJT, started in 2000 and was held annually in Japan or China, is an open forum focused on the needs and interest of the community of a junction formation technology in semiconductors. At the past IWJTs, a number of eminent and experienced scientists and engineers from Asia, America, and Europe presented their latest results on junction technology. The workshop will provide a good opportunity for researchers and engineers to present their new research results, and exchange ideas with leading scientists in this field.

To download more pictures, visit http://bdtwl.fudan.edu.cn/iwjt2010/index.htm

Co-Sponsored by

The Chinese Institute of Electronics
The Japan Society of Applied Physics - Silicon Technology Division
 

Technical Co-Sponsored by
IEEE EDS
IEEE EDS Shanghai Chapter
IEEE EDS Japan Chapter

Supported by
Fudan University
Natural Science Foundation of China
Nissin Ion Equipment Co.,Ltd.
Varian Semiconductor Equipment Associates, Inc. (VSEA)
Ultimate Junction Technologies, Inc.(UJT Lab)